HWCVD Technology Development Addressed to the High Rate Deposition of mi-c-Si:H 

Nos Aguilà, Oriol (Data de defensa: 2013-01-07)

The first block of this thesis deals with the study of the degradation process of tungsten catalytic filaments in the field of silicon deposition with the Hot Wire Chemical Vapour Deposition (HWCVD) technique. The development ...